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Applied Materials Unveils New Epitaxy Technology for High-Performance Transistors

New NMOS epitaxy deposition process is essential for faster transistors inside next-generation mobile processor chips

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By: DAVID SAVASTANO

Contributing Editor, Coatings World and Ink World, Coatings World and Ink World Magazine

Applied Materials, Inc. is extending its leadership in epitaxial (epi) technology with a newly developed NMOS transistor application for its Applied Centura RP Epi system. This capability supports the industry’s move to extend epi deposition from PMOS transistors to NMOS transistors at the 20nm node, enabling chipmakers to build faster devices and deliver next-generation mobile computing power.

“Epi is an essential building block for high-performance transistors, delivering a gain in speed equivalent to that obtained by scaling half a device node,” said Steve Ghanayem, vice president, transistor and metallization products in Applied Materials’ Silicon Systems Group. “By implementing an NMOS epi process in addition to established PMOS epi, we’re enabling foundry customers to further enhance their transistor performance for next-generation devices.”

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